Mircea DusaMircea Dusa is a ASML Fellow and Staff Scientist with ASML. He is a founding member of ASML’s Technology Development Center working on exploratory imaging solutions for advanced lithography tools seeking integration of tool functionality and with non-litho tool components, the photomask, patterning processes and control metrology. Prior to ASML, Mircea held various engineering positions in semiconductor industry, both in R&D and manufacturing, at National Semiconductor/Fairchild Research Center, SEEQ Technology, Zygo Corporation in USA and at ICCE-IPRS in Romania.

He has published over 200 papers in the fields of lithography science and technology at various conferences and in referenced journals. He is a member of IEEE and a SPIE Fellow. He is an active member of SPIE, the International Society of Photo Instrumentation Engineers chaired the Advanced Lithography Symposium between 2013-2016 and Optical Microlithography Conference between 2008-2011. From 2008 to today, Mircea is teaching SPIE’s course on MultiPatterning Principles and Applications.

Mircea Dusa graduated with MS in EE and Solid State Physics from Polytechnic University of Bucharest and holds a Ph. D Degree in Applied Optics from the same university.

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